NSN 5961-01-191-1304 3840683000, 384-0683-000, 01-191-1304
Product Details | DIODE SEMICONDUCTOR DEVICE
5961-01-191-1304 A two electrode semiconductor device having an asymmetrical voltage - current characteristic. May or may not include mounting hardware and/or heatsink. Excludes LIGHT EMITTING DIODE and SEMICONDUCTOR DEVICE,PHOTO. For items containing material such as selenium and copper oxide, see RECIFIER, METALLIC.
Part Alternates: 3840683000, 384-0683-000, 5961-01-191-1304, 01-191-1304, 5961011911304, 011911304
Electrical and Electronic Equipment Components | Semiconductor Devices and Associated Hardware
| Supply Group (FSG) | NSN Assign. | NIIN | Item Name Code (INC) |
|---|---|---|---|
| 59 | 06 OCT 1984 | 01-191-1304 | 20589 ( SEMICONDUCTOR DEVICE, DIODE ) |
Cross Reference | NSN 5961-01-191-1304
| Part Number | Cage Code | Manufacturer |
|---|---|---|
| 384-0683-000 | 88113 | HBC SOLUTIONS, INC. DBA HARRIS BROADCAST |
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Restrictions/Controls & Freight Information | NSN 5961-01-191-1304
| Category | Code | Description |
|---|---|---|
| Hazardous Material Indicator Code | N | There is no data in the HMIS and the NSN is in an FSC not generally suspected of containing hazardous materials |
| Demilitarization Code: | Q | Strategic List Item (SLI). Demilitarization not required. SLI are non-MLI(Munitions List Items) controlled by the U.S. Dept. of Commerce through the Export Administration Regulations (EAR) and indicated on the Commerce Control List (CCL). Each CCL entry is preceded by a four-digit Export Control Commerce Control List Item (CCLI) – MUT to the point of scrap required outside the United States. Inside the United States, MUT is required when the DEMIL integrity code (IC) is “3” and MUT is not required when the DEMIL IC is “6.” |
| Electro-static Discharge Susceptible: | A | No known Electrostatic Discharge (ESD) or Electromagnetic Interference (EMI) sensitivity |
| Precious Metals Indicator Code: | U | Precious metal type is unknown |
| Category | Code | Description |
|---|---|---|
| No Freight Information | ||